The use of CEROBEAR ceramic bearings in the manufacturing of electronic semiconductors for surface optimization of wafers
Precision and cleanliness are of the highest value when handling silicon wafers as a pre amplifier for electronic semiconductor chips. Through CMP- procedures (Chemical mechanical planarization), polishing and cleaning processes can the surface of a wafer reach an evenness in the nanometre range. The use of lithography makes it than possible to apply complex conductor formations.
All movable parts within the CMP-process are subject to very high requirements. Being part of the brush- modules, CEROBEAR ceramic bearings are very resistant to corrosion caused by aggressive cleaning products, deionised water being an example. These bearings are also able to run dry and require no lubricant and thus demonstrate low frictional wear and excellent low viscosity.